发明名称 |
Heat-developable light-sensitive material with polymeric base precursor |
摘要 |
A heat-developable light-sensitive material is described, characterized by containing a polymer having a functional group releasing a basic component upon thermal decomposition in the side chain thereof. This polymer is a new base precursor which when added to heat-developable light-sensitive materials increases their storage stability and permits them to form an image of high density and decreased in fog even after storage. Preferred examples of such polymers are polymers having a repeating unit represented by the general formula (I): <IMAGE> (I) wherein R1, R2 and R3 are each a univalent group, L is a divalent connecting group having from 1 to 20 carbon atoms, M is a cation and x is a number equivalent with the valence of M.
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申请公布号 |
US4595652(A) |
申请公布日期 |
1986.06.17 |
申请号 |
US19850760435 |
申请日期 |
1985.07.30 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
NAKAMURA, TAKU;HIBINO, AKIRA;HIRAI, HIROYUKI |
分类号 |
G03C7/00;G03C1/498;G03C8/40;(IPC1-7):G03C1/40;G03C1/06 |
主分类号 |
G03C7/00 |
代理机构 |
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