发明名称 Method for producing high-aspect ratio hollow diffused regions in a semiconductor body
摘要 A semiconductor device and a method for its preparation are disclosed, wherein a body of semiconducting material has at least one bore extending completely therethrough, this bore having a substantially constant diameter of less than about 1.5 mils and an average length-to-diameter ratio of at least about 6:1, this bore being defined by a region of the semiconducting material in the recrystallized state having therein throughout the region a substantially constant uniform concentration level of atoms of at least one metal selected from the group consisting of aluminum, indium, gallium, antimony, gold, silver and tin in addition to the initial content of the semiconducting material.
申请公布号 US4595428(A) 申请公布日期 1986.06.17
申请号 US19840567708 申请日期 1984.01.03
申请人 GENERAL ELECTRIC COMPANY 发明人 ANTHONY, THOMAS R.;HOUSTON, DOUGLAS E.;LOUGHRAN, JAMES A.
分类号 H01L29/861;H01L21/225;H01L21/24;H01L21/268;(IPC1-7):H01L21/228 主分类号 H01L29/861
代理机构 代理人
主权项
地址