发明名称 DRY ETCHING DEVICE
摘要 PURPOSE:To improve the uniformity and the production efficiency of a dry etching, by arranging shelves for placing objects to be treated in multiple steps in a vacuum vessel into which an etching gas and plasma are introduced and installing shielding plates which separate the objects to be treated from each other to the shelves. CONSTITUTION:In the dry etching device which is provided with a gas introducing pipe 5 through which are etching gas and plasma are introduced and a gas discharging pipe 9 for discharging the etching gas in a vacuum vessel 1, shelves 11 for horizontally placing objects to be treated in multiple steps are provided in the vacuum vessel 1 and the shelves 11 are rotated by means of a motor 14 through a shaft 12 fitted to a supporting table 13 while etching operations are made. Moreover, numerous supporting grooves 15 are provided in both side faces of the shelves 11 and not only the objects to be treated 2 but also Al-made shielding plates 16 are put into the grooves 15, with the shielding plates 16 separating the objects 2 from each other. Accordingly, numerous sheets of objects 2 to be treated can be objected to etching at once and uniformly.
申请公布号 JPS61127877(A) 申请公布日期 1986.06.16
申请号 JP19840250117 申请日期 1984.11.27
申请人 TOKUDA SEISAKUSHO LTD;TOSHIBA CORP 发明人 NONAKA MIKIO;MAEGAKI YOSHIKAZU;WATANABE OSAMU;SHIBAGAKI MASAHIRO
分类号 H01L21/302;C23F1/08;C23F4/00 主分类号 H01L21/302
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