发明名称 PARTIALLY PLATING DEVICE
摘要 PURPOSE:To efficiently perform continuous partial plating of very narrow width, by moving a belt in a groove-like plating liquid supplying section on the upper surface of a plating liquid jetting box and bringing a plating liquid into contact with an object to be plated by receiving the plating liquid with the belt. CONSTITUTION:A plating liquid A is fed to a box main body 15 and supplied to a groove-like plating liquid supplying section 16 through a jetting pot 17. A belt 12 is stretched between a front and rear rolls 24 and moved in the plating liquid supplying section 16 in such a way that the belt 12 blocks the upper side of the jetting port 17. The belt 12 is supplied with the plating liquid A and performs partial plating to an object 19 to be plated which is in contact with the upper surface of the belt 12. The object 19 to be plated is set as a cathode and sufficient anode ions are supplied to the plating liquid A from anodes provided on the right and left sides of the groove of the plating liquid supplying section 16.
申请公布号 JPS61127889(A) 申请公布日期 1986.06.16
申请号 JP19840249660 申请日期 1984.11.28
申请人 ELECTROPLATING ENG OF JAPAN CO 发明人 MURATA YASUTO
分类号 C25D5/02 主分类号 C25D5/02
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