| 摘要 |
PURPOSE:To perform inspection as to 'dust' and 'flaw' extremely easily as well as the defect inspection of semiconductor wafers and masks by providing an angle means which reflect light directed to a reflecting within a specific range nearby an ocular and also adjust the angle of incidence. CONSTITUTION:A tungsten lamp 8 is provided where reflected light is directed to the specific range A nearby the ocular 2 so as to carry out the inspection as to 'dust' and 'flaw' simultaneously with the defect inspection of wafers and masks. A fitting position adjusting metallic fixture 9 is provided so as to vary the angle of incidence of the tungsten lamp 8. The whole microscope is slanted by a slanting table 6 so that the ocular side of a mount surface is lowest to the horizontal plane. Then, it is confirmed visually whether or not and where 'dust' or 'flaw' is present, and then the mount table 10 is moved in two dimensions to put the objective 1 in focus so as to magnify and observe the confirmed position through the microscope, but when the stroke is large, defocusing is caused. For the purpose, a positioning mechanism 7 for moving the mount table 10 vertically is provided.
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