发明名称 HIGH-CURRENT DENSITY ELECTROLYTIC CELL FOR METALLIC STRIP
摘要 PURPOSE:To remove efficiently the gas generated during plating from an electrolyzing surface and to execute high-speed electrolytic treatment at high current density by embedding a suitable number of members formed with apertures into insoluble electrodes of an electrolytic cell and discharging the gas through the apertures. CONSTITUTION:A suitable number of the members (protective bodies) 3 formed with the apertures equal approximately to the width of a strip 1 are disposed at suitable intervals into the insoluble electrodes 2. The gas generated during plating is discharged through the apertures of such protective bodies 3 from a plating chamber. The higher effect is obtd. by forming the 2nd apertures on the outside of the apertures on both sides of the bodies 3 in the transverse direction of the strip to form the circulation path to suck the plating liquid including the gas through the 1st apertures and returning the same through the 2nd apertures to the plating chamber. The treatment of the metallic strip with the high current density is made possible by the electrolytic cell having the above-mentioned mechanism.
申请公布号 JPS61127894(A) 申请公布日期 1986.06.16
申请号 JP19840247540 申请日期 1984.11.22
申请人 KAWASAKI STEEL CORP 发明人 KIMURA HAJIME;MIZUTA TAMOTSU;FUJINAGA TADAO;MURAKAMI SHINJIRO;KOHAMA TETSUYA;IWAMOTO SHUJI;ISHIKAWA SHINJIRO;KIHATA ASAHARU
分类号 C25D13/16;C25D7/06;C25D11/00;C25D13/00 主分类号 C25D13/16
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