| 摘要 |
PURPOSE:To grow plural wafers having a uniform composition in a vapor phase by rotating a stand carrying the wafers thereon and which is inclined to the flow of a gaseous reactant around its axis, and simultaneously revolving the stand around a rotating shaft. CONSTITUTION:A gaseous reactant is introduced from a supply port 12, and discharged into a discharge port 13 while forming a flow with the axial center of a reaction tube 11 as the center. A rotating shaft 14 which is freely rotatable with the axial center of the reaction tube 11 as the center is provided, and rotated by a driving motor 15. Plural discoid stands 17 on which a wafer 16 is set are furnished around the upper end of the rotating shaft 14, and made freely rotatable with the axial center of each stand 17 as the center. Each stand 17 is arranged at equal angles to the axial center of the revolving 14, and arranged at the angle (theta) of about 10-80 deg. to the axial center of the revolving shaft 14. Since a boss 19 provided on the rear surface of the stand 17 is fitted to a columnar shaft 18 provided on the outer periphery of the rotating shaft 14, each stand 17 is revolved around the shaft 14 by the rotation of the rotating shaft 14. Each stand 17 rotates around its axis along with the revolution around the shaft 14 by the meshing of a bevel gear 20 on the outer peripheral surface of the stand 17 with a crown gear 21.
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