DEVELOPING SOLUTION FOR POSITIVE TYPE RESIST AND ITS USING METHOD

摘要

PURPOSE:To obtain satisfactory results with respect to a developing soln. contg. tetramethylammonium hydroxide (TMAH) as a developing main agent by specifying the concn. of TMAH. CONSTITUTION:This developing soln. for a positive type resist contains about 0.83-1.13wt% tetramethylammonium hydroxide as a developing main agent. When the developing soln. is used, the concn. of TMAH is increased in accordance with reduction in the extent of exposure. The developing soln. can be obtd. by diluting a developing soln. for a positive type resist contg. about 1.19% TMAH as a developing main agent with pure water to 70-95wt%.