发明名称 REDUCING PROJECTION EXPOSING DEVICE
摘要 PURPOSE:To reduce a quantity of 'out of focus' of blade image by arranging plural pieces of blades for masking in a conjugate point with an original picture formed by a series of optical lenses and controlling a quantity of the movement of said blades based on a paraxial magnification with the image of the blade which is projected on the original picture. CONSTITUTION:The light of a mercury lamp 2 enters integrator lenses 3 by a means of mirror 1 and the secondary light source image is formed on a pupil 9 of a reduction lens by means of converging collimater lenses 4 and 7 and a relay lens 6. A position of a masking blade open-close mechanism 5 (blade 13) is conjugate with that of a plane of the original picture 8. The relay lens 6 forms an image of the blade 13 on the original picture 8. As the magnification obtained by the lenses 6 and 7 is y'1/y1not equal to y'2/y2, the moving process of the blade 13 is divided into a few sections according to the magnification and by controlling the moving quantity according to the magnification, a stop position 16 can approach to the proper position 17 and the reducing projection exposure in which the total quantity of 'out of focus' 18 is small can be attained.
申请公布号 JPS61127126(A) 申请公布日期 1986.06.14
申请号 JP19840248016 申请日期 1984.11.26
申请人 HITACHI LTD 发明人 TAWA SUSUMU
分类号 G03F7/20;H01L21/027;H01L21/30 主分类号 G03F7/20
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