| 摘要 |
PURPOSE:To perform surface treatment of washing the foreign substance adhered on the surface or etching uniformly a substance to be treated by a method wherein plural spouting nozzles of treating fluid are provided in a treatment tank and turbulent flow action of treating liquid is reduced markedly. CONSTITUTION:A tank 2 made of quartz, which is a part of a wafer washing tank 1, is supported at periphery thereof by a supporting structure 3. A convex section 4 is provided at almost intermediate position at inside wall face of said tank 2 and a shelf member 5, which has many nozzles in horizontal direction is mounted on the convex section 4. Plural wafers 6 which have finished treatment by chemical fluid are housed and placed in a carriage 7 on the shelf member 5. Washing water 11, which is spouted from an upper nozzle 12 spreading to upward, is carried away from a lower short tube 10 and is flowed uniformly on the surface of the wafer 6, then is overflowed from the upper part of the tank 2. Since the inside of the tank 2 is cone-shaped with curved wall face, turbulent flow generates scarcely in the flow of the washing water 11, thereby the washing water 11 can be kept always clean. |
