| 摘要 |
PURPOSE:To make possible normalizing and to prevent the generation of a partial temp. difference of a resist by forming a light shielding film of a mask of a good heat conductive material. CONSTITUTION:The photomask 1 is constituted by depositing the light shielding film 3 atop a glass plate 2 and depositing the resist film 4 atop the film 3. The film 3 is formed of the two-layered construction in which the 1st layer 3a consists of copper and the 2nd layer 3b consists of chromium. Since the copper having excellent heat conductivity (having heat conductivity of about 6 times the heat conductivity of chromium at an ordinary temp.) is used in combination, the generated heat can be quickly diffused over the entire part of the light shielding film even if the heat is locally generated in the light shielding film or the glass surface in the stage of exposing with an electron ray and therefore the generation of the different temp. parts in the resist film owing to the generation of the heat is effectively prevented. The generation of the partial unbalance in the exposing sensitivity occurring from the nonuniform temp. is thereby prevented. The exact exposure patterning is thus attained. |
