发明名称 FORMATION OF RESIST PATTERN
摘要 PURPOSE:To manufacture economically patterns having high resolution in large quantities by forming each fine resist pattern on a blanket for printing having a grease sensitive thin film with thermosetting resist ink. CONSTITUTION:A surface rubber layer is coated with a photosetting and grease sensitive thin film, and this thin film is hardened by irradiating active light to obtain a smooth blanket for offset printing. A fine resist pattern of 50mum width is formed on the surface of the blanket by offset printing with resist ink which can be hardened with active light, and the pattern is hardened with active light. A fine pattern having high resolution, a sufficient thickness and satisfactory resist resistance can be manufactured inexpensively at a high speed. The pattern contains no pinhole or eyehole and has sharp edges.
申请公布号 JPS61123837(A) 申请公布日期 1986.06.11
申请号 JP19840244505 申请日期 1984.11.21
申请人 DAINIPPON INK & CHEM INC 发明人 YASUI TOSHIHIKO;YAMAZAKI MASAHIKO;YAMASHITA SHIYOUZOU
分类号 G03F9/00;G03C5/00;G03F7/26;H05K3/00 主分类号 G03F9/00
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