发明名称 Field-effect transistor with self-aligned gate and method for its manufacture.
摘要 <p>A semiconductor device comprising a compound semiconductor substrate (10) whose surface is provided with a source region (6), a drain region (7) and an interventing channel region (5); a source electrode (8) formed on said source region (6); a drain electrode (9) mounted on said drain region (7); and a 3-ply gate electrode (1) formed on said channel region (5) and consisting of a high melting metal layer (4), a barrier metal layer (3) and a gold layer (2) in that order.</p>
申请公布号 EP0184047(A2) 申请公布日期 1986.06.11
申请号 EP19850114474 申请日期 1985.11.14
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 FURUKAWA, MOTOKI C/O PATENT DIVISION;KISHITA, YOSHIHIRO C/O PATENT DIVISION;MITANI, TATSURO C/O PATENT DIVISION
分类号 H01L21/338;H01L29/47;H01L29/812;H01L29/872;(IPC1-7):H01L29/64;H01L21/28 主分类号 H01L21/338
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