发明名称 |
Field-effect transistor with self-aligned gate and method for its manufacture. |
摘要 |
<p>A semiconductor device comprising a compound semiconductor substrate (10) whose surface is provided with a source region (6), a drain region (7) and an interventing channel region (5); a source electrode (8) formed on said source region (6); a drain electrode (9) mounted on said drain region (7); and a 3-ply gate electrode (1) formed on said channel region (5) and consisting of a high melting metal layer (4), a barrier metal layer (3) and a gold layer (2) in that order.</p> |
申请公布号 |
EP0184047(A2) |
申请公布日期 |
1986.06.11 |
申请号 |
EP19850114474 |
申请日期 |
1985.11.14 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
FURUKAWA, MOTOKI C/O PATENT DIVISION;KISHITA, YOSHIHIRO C/O PATENT DIVISION;MITANI, TATSURO C/O PATENT DIVISION |
分类号 |
H01L21/338;H01L29/47;H01L29/812;H01L29/872;(IPC1-7):H01L29/64;H01L21/28 |
主分类号 |
H01L21/338 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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