| 摘要 |
PURPOSE:To prevent abnormal reaction of substrate at the recessed portions by covering the surface of recessed portions provided to a substrate holder with an insulator. CONSTITUTION:The recessed portions 8A, 8B, 8C, 8D for automatic processing are provided to a substrate holder 3 made of aluminum. each recessed portion is filled with insulator 9A, 9B, 9C, 9D made of alumina and quartz, etc. After forming the recessed portions, a film is deposited on the substrate 2 by plasma reaction or a film is etched, thereby eliminating increase of thickness of film deposited on the recessed portions and an excessive etching of the deposited film. |
