发明名称 TRANSFER DEVICE OF CIRCUIT PATTERN
摘要 PURPOSE:To position a copper laminated plate on a photofilm simply by inserting guide pins into positioning reference holes formed on the copper laminated plate and positioning the photofilm on the determined position of a substrate. CONSTITUTION:The guide pins 1, 2 are implanted on the upper surface of a transparent substrate 3 and engaged with the positioning reference holes 7, 8 formed on the copper laminated plate 11. Then the photofilm 12 having a circuit pattern is put on a transparent plate 5', supported by a transparent plate 5 and fixed by clamps 4. Then, ultraviolet rays are irradiated from an ultraviolet lamp 9 to the upper surface of the transparent plate 5 to transfer the circuit pattern to the surface of a photoresist 10 of the copper laminated plate 11.
申请公布号 JPS61122650(A) 申请公布日期 1986.06.10
申请号 JP19840243969 申请日期 1984.11.19
申请人 TOSHIBA CORP 发明人 ISO MASATOSHI
分类号 G03F7/20;G03F9/00;H05K3/00 主分类号 G03F7/20
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