发明名称 |
Light-sensitive silver halide photographic element with electron beam cured interlayer |
摘要 |
A light-sensitive silver halide photographic element having (a) a cured coated layer on at least one surface of a support material, said cured coated layer having been formed by curing a composition with electron beam radiation, said composition prior to curing comprising (i) a compound having two or more unsaturated double bonds in its molecule which is curable by electron beam irradiation, (ii) an inorganic white pigment and (iii) a coupling agent having two or more different reactive groups in its molecule, one of said reactive groups being chemically reactive with the inorganic white pigment to form a chemical bond therewith and said other reactive group being chemically reactive with said compound (i) to form a chemical bond therewith and (b) at least one layer of silver halide emulsion on said coated layer.
|
申请公布号 |
US4594315(A) |
申请公布日期 |
1986.06.10 |
申请号 |
US19840647977 |
申请日期 |
1984.09.06 |
申请人 |
KONISHIROKU PHOTO INDUSTRY CO., LTD. |
发明人 |
SHIBUE, TOSHIAKI;NAGAYASU, KOICHI |
分类号 |
D21H19/58;G03C1/79;G03C1/93;G03C1/95;(IPC1-7):G03C1/76 |
主分类号 |
D21H19/58 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|