发明名称 Light-sensitive silver halide photographic element with electron beam cured interlayer
摘要 A light-sensitive silver halide photographic element having (a) a cured coated layer on at least one surface of a support material, said cured coated layer having been formed by curing a composition with electron beam radiation, said composition prior to curing comprising (i) a compound having two or more unsaturated double bonds in its molecule which is curable by electron beam irradiation, (ii) an inorganic white pigment and (iii) a coupling agent having two or more different reactive groups in its molecule, one of said reactive groups being chemically reactive with the inorganic white pigment to form a chemical bond therewith and said other reactive group being chemically reactive with said compound (i) to form a chemical bond therewith and (b) at least one layer of silver halide emulsion on said coated layer.
申请公布号 US4594315(A) 申请公布日期 1986.06.10
申请号 US19840647977 申请日期 1984.09.06
申请人 KONISHIROKU PHOTO INDUSTRY CO., LTD. 发明人 SHIBUE, TOSHIAKI;NAGAYASU, KOICHI
分类号 D21H19/58;G03C1/79;G03C1/93;G03C1/95;(IPC1-7):G03C1/76 主分类号 D21H19/58
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