| 摘要 |
PURPOSE:To enable good X-ray lithography to be executed by forming a mask holder of a laminate of aluminum nitride and boron nitride. CONSTITUTION:The laminate for constituting the mask holder may be made of the 2 layers of the aluminum nitride layer and a boron nitride layer, of the >=3 layers of >=2 layers of either of them and one layer of the other. Especially when the boron nitride layer superior in resistance to chemicals is laminated as the protective layer of the aluminum nitride, the obtained laminate is excellent in X-ray and light transmittance, heat conductivity, electric conductivity, resistance to chemicals, etc. The thickness of mask holder is not especially limited, but it is advantageous to control it, e.g., within 2-20mum. |
