| 摘要 |
PURPOSE:To arbitrary control the distribution of film thickness in the radial direction of an electrode as well as to reduce the irregurality of film thickness by a method wherein a coil is connected to a power electrode, and a DC power source is connected to a substrate electrode. CONSTITUTION:A DC power source 8 is connected to a substrate electrode 1, a coil 10 is connected to a power electrode 2, a DC voltage is applied while a high frequency electricity is being discharged, and a DC circuit consisting of a DC power source 8, a substrate electrode 1, a power electrode 2 and a coil 10 is formed. As a result, when negative bias voltage is applied, the film thickness in the vicinity of the center part is reduced and the film thickness on the circumference is increased because the plasma moves away from the substrate electrode by having a recess in the center part, and on the contrary, when a positive bias voltage is applied, the film thickness is increased in the vicinity of the center part, and the film thickness on the circumference is decreased. Also, if no voltage is applied, a uniform film thickness is obtained on the whole surface. This is because the plasma is stabilized by connecting a coil and that it is transformed and moved by applying bias voltage. |
