| 摘要 |
PURPOSE:To eliminate an operator's wrong selection of a developing process by diffracting spectrally and analyzing reflected light from a resist surface by a photospectroscope and selecting the developing process according to spectral characteristics. CONSTITUTION:An operator sets an exposed resist-coated plate 2 on a spinner chuck 1. Light 4 is projected on the resist surface from a light source 3 and its reflected light 5 is guided to the photospectroscope 6 to check its spectral characteristics. The spectral characteristics are sent to an arithmetic part 7 and compared with spectral characteristics of resist which are stored previously in a storage part 8 to determine what kind of resist is used. The result is sent to a sequencer 9 and a developing process is selected to perform development. Consequently, the operator performs the development without selecting a wrong developing process. |
