发明名称 CHARGED PARTICLE BEAM LITHOGRAPHY EQUIPMENT
摘要 PURPOSE:To prevent the pattern precisin from deteriorating due to the coefficient converting laser unit into metric unit by a method wherein out of the two step deflection devices, one deflection is defined by laser unit coordinate base while the other deflection is defined by metric unit. CONSTITUTION:Beam dimension data, beam position data are respectively transmitted in metric unit while the positions of stage 6 continuously shifted are measured by a laser interferometer 7 to output pulse at the rate per 2/120=0.00527416mum (2:0.6329mum). In case the sub-deflection is 64mum in metric unit is preliminarily programmed in laser unit to be inputted since any value to be inputted in the main deflection DAC 10 shall be in laser unit. the main deflection amplifier 9 may amplify the deflection consistently since both signals from the stage 67 and signals from deflected data are inputted in laser unit. Finally the error (error of 1213477 raised to 12135) of 64mum converted into laser unit may be thinned out every three times not to be accumulated.
申请公布号 JPS61119033(A) 申请公布日期 1986.06.06
申请号 JP19840239473 申请日期 1984.11.15
申请人 TOSHIBA CORP 发明人 NAKASUJI MAMORU
分类号 H01L21/027;H01L21/30;(IPC1-7):H01L21/30 主分类号 H01L21/027
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