发明名称 HORIZONTALLY MOVING MECHANISM OF SUBSTRATE HOLDER IN HIGH VACUUM
摘要 PURPOSE:To reduce the size over the entire part of a vacuum device by project ing at least two pieces a pair of revolving shafts to the inside and outside of the device body, turning the revolving shafts to move a substrate holder in the device body and positioning the same by means of a sensor. CONSTITUTION:A pair of the revolving shafts 26, 27 are rotated via a chain 35 by driving a motor 32 in the case of moving horizontally the substrate holder from a vacuum chamber 22 of the device body 21 to a preliminary chamber 23. A conveying base 40 carrying the substrate holder is guided by guide roller trains 42, 43 and is moved by the meshing of a pinion 39 and a rack 41 from the chamber 22 side to the chamber 23 side according to the above-mentioned revolution. The rack 41 meshed with the pinion 38 moves further and is detected by a monitor 51 consisting of a light emitting element 51a and a photodetector 51b which feeds a stop signal to a control part to stop the motor 32 and to stop the substrate holder at the set position in the chamber 23. The motor 32 is driven in reverse direction in the case of moving horizontally the substrate holder from the chamber 23 to the chamber 22.
申请公布号 JPS61117278(A) 申请公布日期 1986.06.04
申请号 JP19840238320 申请日期 1984.11.14
申请人 HITACHI LTD 发明人 TAKIMOTO HIROTAKA;UMESHIMA TAKAO
分类号 H01L21/677;B01J3/02;C23C14/50;H01L21/67 主分类号 H01L21/677
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