| 摘要 |
PURPOSE:To extremely simplify processing of a minute pattern without requiring to form an insulating layer of a thick film as a background by forming a part of a multilayer background while piling up color filter layers for darkening for constituting this as the background. CONSTITUTION:After forming the first color filter layer 2B on one surface of a glass substrate 1 and for region-selectively forming the first single layer filter part 5, the color filter layer 2B of said part is removed, for instance, by a photolithography method. The second color filter layer 2R is formed on the first color filter layer 2B and in order to form the second single layer filter part 6, etching treatment is given by the etching liquid, which acts selectively to the second color filter layer 2R of said part for removing said part. Next, anode conductors 3 are arranged on the respective single layer filter parts 5 and 6 for coating the anode conductors 3 with a fluorescent character material 4. |
