| 摘要 |
PURPOSE:To make easy ultraminiaturization of metal pattern and eliminate considerations to X-ray transmissivity of substrate itself by using the characteristic X-ray obtained by irradiating metal pattern of substrate surface with electron beam. CONSTITUTION:When a Pd pattern 6 is formed on a substrate 3 consisting of BN1 and polyimide layer 2 and it is irradiated with the electron beam 7 from the rear side, the characteristic X-ray 5c is released from the Pd pattern 6. The X-ray exposure is carried out using it. In this case, since the metal pattern 6 can be easily miniaturized and the X-ray having passed the substrate is not used, any consideration to X-ray transmissivity of substrate is not required and constitution can be established easily. |
