| 摘要 |
<p>PURPOSE:To improve the reliability of a test and to shorten the testing time by transferring the pattern of a reticle to be tested and that of a reference reticle to the same substrate and comparing both the patterns. CONSTITUTION:A contracted chip pattern 8 of a reticle to be tested and a contracted chip patter 9 of a normal reference reticle are transferred to a photomask substrate at least by one shot on the basis f a step-and-repeat method and then a photomask 7a is produced by development and etching. Subsequently, the chip pattern 8 of the reticle to be tested is compared with the chip pattern 9 of the reference reticle by a comparator 11 to test the difference of both the patterns.</p> |
