发明名称 Growth of oxide thin films using solid oxygen sources
摘要 Oxide (RmOn) films are grown by evaporation from separate sources of element (R) and an oxide (MrOs) which serves as the oxygen source. The oxide (MrOs) should sublimate congruently; i.e., without decomposing into oxygen and its constituent element (M). On the growth surface this oxide (MrOs) can react with the element (R) to form another oxide (RmOn) that is thermodynamically more stable: mR+MrOs->RmOn+MrOs-n Using this technique, films of Al2O3, MgO, SiO2, and MgAl2O4 have been grown using As2O3 or Sb2O3 as the oxygen source.
申请公布号 US4592927(A) 申请公布日期 1986.06.03
申请号 US19840585014 申请日期 1984.03.02
申请人 AT&T BELL LABORATORIES 发明人 STALL, RICHARD A.
分类号 C23C14/08;H01L21/316;(IPC1-7):C23C16/40 主分类号 C23C14/08
代理机构 代理人
主权项
地址