发明名称 |
SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE |
摘要 |
PURPOSE:To set the circuit threshold voltage of a CMOS circuit freely by forming potential difference among each substrate and source for a first conduction type channel MOS transistor constituting an input section and a second conduction type channel MOS transistor. CONSTITUTION:A p channel MOS transistor 20 and an n channel MOS transistor 212 form an inverter circuit constituting an input section for a CMOS.IC, and a p channels MOS transistor 22 and an n channel MOS transistor 23 represent transistors organizing circuits after an internal circuit. Voltage VGBP and voltage VGBN are each applied in the reverse bias direction among several source and substrate for the p channel MOS transistor 20 and the n channel MOS transistor 21. Only the threshold voltage of the transistor for the input section is changed by a back-gate-bias effect. Accordingly, circuit threshold voltage can be set freely. |
申请公布号 |
JPS61115349(A) |
申请公布日期 |
1986.06.02 |
申请号 |
JP19840237023 |
申请日期 |
1984.11.09 |
申请人 |
MITSUBISHI ELECTRIC CORP |
发明人 |
TANIGUCHI MASAHARU;MIYAZAKI YUKIO |
分类号 |
G11C11/408;H01L21/8238;H01L27/092;H01L29/78 |
主分类号 |
G11C11/408 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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