| 摘要 |
PURPOSE:To make it feasible to bring all wafers into contact with processing gas at even temperature by a method wherein the title heater is composed of a reaction tube, a heat equalizing tube, a heater, a basket carrying wafers to the heater, a basket stage and loading mechanism. CONSTITUTION:A basket 5 containing multiple wafers 4 mounted on a basket stage 6 is driven by a driving mechanism 7 from a carrier port 20 to carry wafers inside a reaction tube 1. A heat equalizing tube 2 is arranged on the periphery of reaction tube 1. The reaction tube 1 is heated by a cylindrical heater 3 divided into multiple parts in the vertical direction. The peripheral part of heater and the carrier port 20 is heat-insulated by a heat insulator 13 and heat insulating fire bricks 11. The heater 3 is held by a base 12 and another heat insulating fire bricks 11a. An admission port 14 is provided near a gas inlet 8 on the carrier port 20 side and processing gas inlet. The processing gas supplied through the intermediary of the admission port 14 is led to a vertex part 18 through a gas canal 17 formed of the reaction tube 1 and an inner tube 16. |
