| 摘要 |
PURPOSE:To improve the treating capacity of a wafer by providing plural carrying lines containing a carrying-in chamber and a carrying-out chamber which are opposed adjacently to a treating chamber, and providing a mechanism for carrying successively the wafer on each carrying line to the treating chamber. CONSTITUTION:An end station is constituted with a common treating chamber 60 of a high vacuum, the first carrying-in chamber 20 and the first carrying-out chamber 40 of a low vacuum, which are opposed adjacently to said chamber, and the second carrying-in chamber 30 and the second carrying-out chamber of a low vacuum, which are opposed adjacently to the treating chamber 60 in the shape of going straight to this carrying line. The carrying-in chamber 20 and 30 are provided with carrying belts 22, 32 and gate valves 23, 24, 33, and 34, respectively, and carrying belts 21, 31 on the inlet part, and a wafer W is carried in by one sheet each from the air. Also, carrying belts 42, 52 and gate valves 43, 44 are provided, and carrying-out belts 41, 51 are provided on the outlet, and the wafer W is carried out by one sheet each into the air. |
