| 摘要 |
<p>PURPOSE:To enable to simply correct a white-spot defect by a method wherein a focussed ion beam is made to irradiate at the white-spotted defect of a mask, and the surface of the mask base material of the defective part is formed into a recessed shape. CONSTITUTION:The white-spotted defect of a mask 7 is detected, and the detected position is memorized in a controlling device 8. A stage 6 is shifted by the controlling device 8, an ion beam is made to irradiate on the defective part of the mask, deflection voltage is applied to a deflecting plate, and an ion beam is scanned on the defective part. Moreover, the distance of movement of the stage 6 is monitored by a laser interferometer 11, and the error of movement of said stage is corrected by superposing a correction signal on the deflection signal to be applied to the deflection plate 9. The ion beam is scanned in lattice form on the white-spotted defect, the surface of the substrate G whereon an ion beam is made to irradiate is sputtered, and a number of V-shaped grooves M are formed on the cross-section. As the transmittivity of light at the substrate part, where a number of grooves are formed, is reduced remarkably, the substrate part is turned to the condition same as the normal part where a chromium film is substantially provided.</p> |
