ELECTRON BOMBARDMENT TYPE VAPOR DEPOSITING APPARATUS

摘要

PURPOSE:To improve the controllability by placing an ion gun for irradiating a cation beam together with an electron beam from an electron gun on an evaporating source as a material for a thin film made of an insulator in a vacuum vessel so as to inhibit negative electrostatic charge by the electron beam. CONSTITUTION:This electron bombardment type vapor depositing apparatus is provided with an electron gun 4, an evaporating source 6 as a material for a thin film made of an insulator and a substrate 6 on which vapor is deposited in a vacuum vessel 2. An ion gun 3 for irradiating a cation beam together with an electron beam from the electron gun 4 on the evaporating source 5 is further placed in the vacuum vessel 2.