发明名称 VACUUM CONTINUOUS TREATER
摘要 PURPOSE:To prevent the generation of contamination while carrying materials to be treated regardless of the arrangement of a treating chamber corresponding to use conditions by placing the materials to be treated in each chamber, such as an inserting chamber, the treating chamber, etc. and mounting an arm mechanism conducting revolving operation and vertical operation. CONSTITUTION:A handle 26 for revolution turns an arm 25, on which a substrate 8 is placed, through a hollow shaft 27, bevel gears 28, 29 and a hollow shaft 30. A handle 31 vertically moves the arm 25 through a rod 32, a cam 33 and a rod 34. The arm 25 mounted into a vacuum chamber is operated by the handles 26, 31 fitted on the atmospheric air side. A groove 35 is shaped to a tray loading section for the arm 25, and its own weight of a tray 36 is worked to the groove 35 and a slip-off from the arm 25 is prevented during a carrying by the tray 36. The tray 36 is interposed between the rod 34 and the arm 25, thus preventing the contamination of the substrate 8 by a contact.
申请公布号 JPS61112312(A) 申请公布日期 1986.05.30
申请号 JP19840233135 申请日期 1984.11.07
申请人 HITACHI LTD 发明人 JINNO YUKISHIGE;HIRAISHI NOBUYUKI;UCHIDA KENJI;SAITO MAKOTO;KOKADO YUICHI
分类号 C08F2/00;C08F2/52;C23C14/56;H01L21/02;H01L21/205;H01L21/302;H01L21/3065;H01L21/31;H01L21/677 主分类号 C08F2/00
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