| 摘要 |
PURPOSE:To obtain an optical recording medium having excellent oxidation resistance as well as outstanding C/N, pit shape, contrast and durability by forming a metal-sulfur fluoride plasma deposited film or metal-sulfur fluoride- org. compd. plasma deposited film on a substrate. CONSTITUTION:The substrate 3 consisting of glass, plastic, metal, etc. is disposed in the upper part in a vacuum vessel 1 and a gaseous mixture composed of the gas expressed by SFx (X is 1-6, generally 6) and dimethyl formamide (DMF) is introduced into the vessel through an introducing port 2. Electric discharge is induced by a high-frequency coil 4 and Te is evaporated from a resistance heater 5 to form the Te-SFx-(-org. compd.) plasma deposited film on the surface of the substrate 3. The deposited film contains preferably >=50-95vol% Te. The SFx is 5-50vol.% in the case of the two-component system of Te-SFx. The SFx-org. material is 5-50vol% and the org. material is incorporated preferably at the higher ratio than the SFx in the case of the three component system of Te-SFx-org. material. The optical recording medium having the excellent C/N, pit formability and shelf life is thus obtd. |
