| 发明名称 |
Method of projecting a photoelectron image. |
| 摘要 |
<p>A method for projecting a photoelectron image includes the steps of providing a mask substrate (12, 61), selectively depositing thereon a layer (33, 63) which lowers the work function of the mask substrate areas contacted thereby, and bringing about photoelectron emission from the contacted areas.</p> |
| 申请公布号 |
EP0182665(A2) |
申请公布日期 |
1986.05.28 |
| 申请号 |
EP19850308461 |
申请日期 |
1985.11.20 |
| 申请人 |
FUJITSU LIMITED |
发明人 |
YASUDA, HIROSHI;HONJO, ICHIRO |
| 分类号 |
G03F7/20;H01J37/317;(IPC1-7):H01J37/317 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
