发明名称 HYBRID INTEGRATED CIRCUIT
摘要 <p>PURPOSE:To stabilize an integrated circuit and improve performance thereof by constituting a foundation metal for metallizing as a resistance element. CONSTITUTION:A foundation metal (such as Cr, NiCr, etc.) is evaporated onto an alumina substrate 10 to form a foundation metallic film 14. A conductor film 15 and the foundation metallic film 14 are etched. The conductor film 15 is etched according to a predetermined pattern to shape a resistance element 7. Consequently, a resistor is prepared by the foundation metal, thus transmitting signals without generating the imbalance of characteristic impedance by small transmission loss. When manufacturing a thick-film substrate, the foundation metal is printed on the alumina substrate 10 to shape the foundation metallic film 14, processes in which patterning and baking are added are replaced with a first process, and the same process as mentioned above is conducted.</p>
申请公布号 JPS61107755(A) 申请公布日期 1986.05.26
申请号 JP19840230613 申请日期 1984.10.30
申请人 MITSUBISHI ELECTRIC CORP 发明人 FUJIOKA KOJI
分类号 H01C7/00;H01L27/01;H05K1/16 主分类号 H01C7/00
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