发明名称 HEAT DEVELOPING PHOTOSENSITIVE MATERIAL
摘要 PURPOSE:To obtain the titled material having a good developing activity, and to obtain a picture image having a high contrasty and less tendency for generating a fog and to improve a storage stability by incorporating a polymer having a specific monomer unit as a constituting component as a base precursor. CONSTITUTION:The prescribed polymer contains a monomer unit shown by formula I as the constituting component. In formula I, R1 is a hydrogen atom or 1-6C substd. or unsubst. alkyl group, L is 1-20C divalent binding radical, M is a cation, (x) has the same number of charges to that of a cation M, alkyl group comprises more preferably a methyl group. The divalent binding radical preferably contains p-phenylene, or m-phenylene groups, the cation comprises preferably a sodium, a potassium, a cesium, and a barium ions, a quaternary ammonium ion having <=8 total carbon numbers or a protonized base having >=7 pKa. The polybasic precursor preferably comprises polycarboxylic acid salt capable of decarboxylation at a temp. of 80-200 deg.C, preferably 100-200 deg.C.
申请公布号 JPS61107240(A) 申请公布日期 1986.05.26
申请号 JP19840228551 申请日期 1984.10.30
申请人 FUJI PHOTO FILM CO LTD 发明人 NAKAMURA TAKU;HIRAI HIROYUKI
分类号 C08F8/00;C08F8/30;C08F8/44;C08F12/00;C08F12/04;C08F20/52;C08F20/58;C08F220/00;G03C1/06;G03C1/498;G03C7/00;G03C8/40 主分类号 C08F8/00
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