| 摘要 |
PURPOSE:To enable to execute a drawing of patterns of an inspection on pattern at a high speed by a method wherein plural pieces of patterns being registered in an image memory are read out, the read-out patterns are converted into rasters and the generation of the patterns is performed in time series. CONSTITUTION:The pattern of a mask 2 to be inspected put on an X-Y scanning stage 1 is illuminated with an illuminating light source 3 through a half mirror (semitransparent mirror) A and the expanded image is detected by an imaging device 5. On the other hand, a model pattern signal 8 to correspond to the mask 2 is made to generate by a design pattern generator 7 on the basis of data 6 for inspection converted the design data used when the mask 2 is manufactured into the format suitable for inspection. The signal 8 is made to correspond to an inspection pattern signal 9 and a synchronism of both signals 8 and 9 is made by a stage control unit 10. The signals 8 and 9 are compared in a comparator 12, the good or bad of the signal 8 is discriminated according to a defect discriminating algorithm and when the signal 8 have a defect, matters for the defect are recorded in a defect recording unit 13 and are utilized for the correction and so forth of the mask, which are conducted afterwards. |
