发明名称 MANUFACTURE OF ENAMEL SUBSTRATE AND DEVICE THEREFOR
摘要 PURPOSE:To prevent a dispersion of a thickness of an enamel layer, and to obtain a uniform enamel substrate by forming an upward flow by stirring an enamel dispersing liquid in a tank, and thereafter, performing an electrophoretic treatment. CONSTITUTION:A partition plate 3 provided with an interval from a bottom part 2 is placed in about the center part in a tank 1. A stirrer 4 is provided on one partitioned part, plate-shaped electrodes 7, 8 are provided on the other, and an iron plate 9 is placed between the electrodes 7, 8. When a stirring rod 7 is rotated by operating the stirrer 4, an enamel dispersing liquid 6 of the stirrer 4 side passes through a cavity part 10 of the lower part of a partition 3 and flows in under the iron plate 9 side. This dispersing liquid 6 flows out to the stirrer 4 side from the upper end of the partition 3, therefore, a flow of the dispersing liquid 6 going to the liquid surface form the bottom part is formed on the iron plate 9 side. After the stirrer 4 has been stopped, a voltage is applied between the electrodes 7, 8 and the iron plate 9, and an electrophoretic treatment is performed. According to this method, glass particles are dispersed uniformly in the liquid, and an enamel layer of a uniform composition is formed on the surface of the iron plate 9.
申请公布号 JPS61106799(A) 申请公布日期 1986.05.24
申请号 JP19840228586 申请日期 1984.10.30
申请人 HITACHI CONDENSER CO LTD 发明人 UOZU NOBUO
分类号 C25D13/00;C23D5/02;C25D13/02;C25D13/22 主分类号 C25D13/00
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