发明名称 PROCESS FOR FORMING SINGLE CRYSTAL SILICON FILM
摘要 PURPOSE:To form a film having a uniform bearing on an insulating body at low temp. and in a short time by using a technique for controlling the bearings of crystal of the silicon film after forming a single crystal in combination with a technique for forming a single crystal by changing the position of liquid drops of a metal/silicon single crystal. CONSTITUTION:A particle of silicon single crystal or aggregated particle 1 having <100> bearing in a direction perpendicular to the substrate surface is provided on an amorphous insulating body 4. Further, a metal/silicon compound body 2 is provided adjacent to the aggregated body 1. Additionally, a polycrystalline 3 or amorphous silicon film is provided adjacent to said compound body 2. Thereafter, the compound body 2 is melted by a local heating means forming a liquid drop 9 of the metal/silicon alloy, and the liquid drop 9 is moved toward the above-mentioned crystal 3. Thus, a (100) single crystal silicon film is formed from said aggregated body 1 as seed crystal on the above- described amorphous insulating body 4.
申请公布号 JPS61106483(A) 申请公布日期 1986.05.24
申请号 JP19840224624 申请日期 1984.10.25
申请人 NEC CORP 发明人 KIMURA MASAKAZU
分类号 C30B13/06;C30B13/02;C30B29/06;H01L21/208 主分类号 C30B13/06
代理机构 代理人
主权项
地址