| 摘要 |
PURPOSE:To form an excellent soft magnetic pattern by forming a pattern of two kinds of non-magnetic materials on the magnetic bubble material, and after laminating a soft magnetic material, by flattening the soft magnetic material and the primary-layer non-magnetic material by etching. CONSTITUTION:The primary layer 12 and 13 of non-magnetic materials is formed on a magnetic bubble material 10 and a spacer 11. A soft magnetic material 14 is laminated including these layers, and then the layer 14 that is on the layers 13 and 12 is removed by means of etching. In consequence, the layer 12 and the soft magnetic material 14 are flattened to make one plane. Therefore, the photoresist 15 to form a soft magnetic material pattern 16 is formed with uniform thickness. Thus an excellent soft magnetic pattern is formed by means of such as photoresist etching.
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