| 摘要 |
<p>PURPOSE:To produce a photomask only in one process by using a light excited CVD to form directly a pattern consisting of a metallic film on a transparent substrate. CONSTITUTION:A transparent substrate 1 for photomask is fixed on a movable stage 3 provided in a pattern generation chamber 2. The pattern generation chamber 2 is filled up with gaseous materials 4 of the light excited CVD. An exciting light 5 used to form a desired pattern the substrate 1 is irradiated to the substrate 1 through an optical window 6 provided in the chamber 2. Molecules of gaseous materials bring about the active transition state by electronic excitation or oscillatory excitation, and finally, a reaction product is formed on the substrate 1.</p> |
