PHOTOMASK AND METHOD OF TESTING IT,申请号DE19823270577-传众专利搜索

发明名称	PHOTOMASK AND METHOD OF TESTING IT
摘要	A photomask comprises a tested pattern (P1, P2) and a synchronization pattern (SP1 DIFFERENCE SP8). The synchronization pattern is used for synchronizing a scanning signal (S9), obtained from the tested pattern, with a reference signal (S10), based on a reference pattern data stored on a magnetic tape (7).
申请公布号	DE3270577(D1)	申请公布日期	1986.05.22
申请号	DE19823270577	申请日期	1982.05.28
申请人	FUJITSU LIMITED	发明人	KOBAYASHI, KENICHI
分类号	G01N21/956;G03F1/00;G03F1/38;H01L21/027;H01L21/30;H01L21/66;H01L21/68	主分类号	G01N21/956
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