| 摘要 |
PURPOSE:To stabilize the temperature of a developing liquid and to obtain a pattern having a stabilized accuracy, by supplying the developing liquid on a semiconductor wafer through a plate, which encloses a heater that increases temperature to a constant temperature and has a large thermal capacity. CONSTITUTION:A plate 1 is heated to a constant temperature by a heater 5. Meanwhile, a semiconductor wafer 4 is set on a spindle chuck 3. Then, the chuck 3 is lifted. The gap between the wafer 4 and the plate 1 is maintained at about 1.5mm. The temperature of the developing liquid (f), which is fed by a developing liquid pipe 2 is heated to the constant temperature. The developing liquid is supplied to said gap through openings 6, and a pattern is developed. Since the plate 1 is thick, heat is accumulated, and abrupt fluctuation of heat is not yielded. Therefore, the wafer 4 is developed at the stabilized temperature of the developing liquid. It is effective that the spindle chuck 3 is rotated to stir the developing liquid so that it is not sprayed to the outside. Under this state, the wafer is kept for a required time period. Then the chuck is lowered. The wafer is washed by water and dehydrated by centrifugal operation. Thus the stable developing state is obtained. |
