| 摘要 |
PURPOSE:To enable preparation of a thin film of the specified minute area and observation of a transmitted image to be performed in the same system by installing a device for preparing thin films of the sample in a transmission electron microscope. CONSTITUTION:A device for preparing thin films is located in the selected area for the intermediate lens. It is constituted of an ion gun 1, a sample holder 2, an air lock 3, a contamination-preventing cover 4, a flange 5 and a selected area diaphragm 6. Since the sample 7 is located on the optical axis of the electron microscope, a sufficient space is allowed and transmission images of around several ten thousand times can be easily observed. Owing to the above structure, preparation of a thin film of the sample and observation by a transmission electron microscope can be simultaneously performed in the same system. Therefore, it is possible to reliably prepare a thin film of the minute area of a semiconductor device to be examined. Consequently, a thin film of the specified minute area can be reliably prepared in a short time and structural analysis of the sample can be efficiently performed by the transmission electron microscope. |
