| 摘要 |
PURPOSE://To align accurately a reticle with a water, by detecting properly a stepped portion of an alignment mark on a substrate, such as a resist-coated wafer, etc. CONSTITUTION:On an optical system 104, an image of alignment mark for both reticle 100 and wafer 102 is developed with respect to an image developing system 108. An image signal from the system 108 is stored in a memory system 112 through a signal-processing system 110. Next, the center position of a mark of a reticle 100 is obtained by the image signal and a mark-center-position detecting unit 114. Next, a peak-position of the image signal is detected by a peak-position detecting unit 116 and correspondence relations are compared with a peak-position correspondence comparing unit 118 and detection is made for the end portion of the segment and the result is introduced into a mark- center detecting unit 122 for obtaining the center position of the mark of a wafer. The center position of the mark is detected by a mark-deviation-amount detecting unit for a degree of deviation and corrections of deviations of reticle 100 and wafer 102 are accomplished through a stage-controlling system 126.
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