发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 PURPOSE:To obtain the titled composition composed of a completely or partially saponified polyvinyl acetate and having an excellent thermal stability by incorpo rating a polymer contg. three specific monomers to the titled composition. CONSTITUTION:The polymer comprises 100pts.wt. above described polyvinyl acetate having 50-100mol% saponification value, 20-300pts.wt. photopolyme rizable unsatd. compd. having an ethylenical double bond in a molecule, and 0.001-1wt% N-nitrosohydroxylamine deriv. shown by the formula, on the weight basis of the polymer in the formula, R is 1-18C aliphatic, alicyclic, cycloaliphatic and aromatic hydrocarbon residues which may be substituted with a halogen atom, a hydroxyl, or a cyano group, X is a hydrogen atom, a metal belonging to 1-3 a main or a sub group in a periodic table, an 8 sub group in said table or an ammonium radical which may be substd., (n) is 1-5, and satisfies a positive electric charge. The titled composition having the above described characteristics is obtd. by applying the prescribed polymer to the titled composition.
申请公布号 JPS61103150(A) 申请公布日期 1986.05.21
申请号 JP19840223894 申请日期 1984.10.26
申请人 TORAY IND INC 发明人 FUJIKAWA JUNICHI;TOKUNOU MASAZUMI
分类号 G03F7/038;G03F7/027 主分类号 G03F7/038
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