发明名称 METHOD OF FORMING DEPOSITED FILM
摘要 PURPOSE:To obtain a deposit film by separately introducing a C compound and an active seed manufactured by decomposing a compound containing Ge and halogen into a film-forming space and exciting and reacting the C compound through the projection of light energy. CONSTITUTION:A polyethylene terephthalate thin-film is positioned onto a base, and a depositing space space is evacuated to 10<-6>Torr or less. The thin- film is kept at approximately 50 deg.C, and predetermined hydrocarbon such as CH4 or PH3 or B2H6 as required are diluted by H2 and introduced as a depositing raw material gas. On the other hand, GeF4 is blown into molten Ge, and an active seed GeF*2 is formed and introduced. When a film-forming space is kept at 0.1Torr and the thin-film is irradiated vertically by a Xe lamp, non-doped or doped amorphous deposit film containing C is acquired. According to the constitution, a film formation rate is increased remarkably, the tempera ture of a base body can also be lowered, only a desired section is irradiated selectively and the deposit film can be shaped partially, and the quality of the film is also stabilized.
申请公布号 JPS61102028(A) 申请公布日期 1986.05.20
申请号 JP19840223082 申请日期 1984.10.25
申请人 CANON INC 发明人 ISHIHARA SHUNICHI;HIROOKA MASAAKI;ONO SHIGERU
分类号 H01L31/04;H01L21/205;H01L21/263;H01L31/0248 主分类号 H01L31/04
代理机构 代理人
主权项
地址