发明名称 Method for annealing by a high energy beam to form a single-crystal film
摘要 A large single-crystalline film on an amorphous insulator is formed by high energy beam annealing. The crystal growth of a molten polycrystalline or amorphous film on the insulator is controlled to occur from the central region toward the outer edge of the molten zone. This control is accomplished by using, for example, a doughnut-shaped laser beam.
申请公布号 US4589951(A) 申请公布日期 1986.05.20
申请号 US19840683955 申请日期 1984.12.19
申请人 FUJITSU LIMITED 发明人 KAWAMURA, SEIICHIRO
分类号 H01L21/20;H01L21/268;(IPC1-7):C30B13/24 主分类号 H01L21/20
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