| 摘要 |
An exposure apparatus for exposing a wafer to a circuit pattern formed on a reticle. The exposure apparatus includes a reticle stage for holding the reticle, a wafer stage for holding the wafer, a projection optical system for projecting the image of the circuit pattern onto the wafer, an illumination system for illuminating the reticle, the illumination system having a light source for providing an illumination light beam and optical elements for guiding the illumination light beam along an illumination light path, and a stop disposed in the illumination light path and at a position which is optically conjugate, with respect to the optical elements, with a plane in which the circuit pattern is placed, to intercept a part of the illumination light so that the area of the reticle which is not used for the pattern transfer is shielded from the illumination light without disposing any element in contact with or in the proximity of the reticle.
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