| 摘要 |
PURPOSE:To improve the ionization rate of evaporating particles and to form a thin film having good quality by passing successively the evaporating particles evaporated by an electron beam through the holes of an electrode impressed with a negative voltage and the holes of an accelerating electrode impressed with a negative high voltage and sticking said particles to a substrate. CONSTITUTION:The inside of a bell-jar 1 is evacuated to a high degree of vacuum and power sources 3, 9, 11, 14 are operated; at the same time, an inert gas is supplied from a gas supply means 12 into a chamber S. The electron beam is fed from an electron beam generator 10 to the chamber S and is bombarded to the evaporating material 5 in a crucible 6 to generate the evaporating particles. Reflected electrons are at the same time generated by the bombardment of the electrons. The evaporating particles and gas particles are ionized when the reflected electrons are filled in the chamber S. The ionized evaporating particles and the unionized evaporating particles pass through the holes 8a, 8b, etc. of the disk-shaped electrode 13 impressed with the negative DC voltage. The particles are further accelerated by the accelerating electrode 13 impressed with the negative high DC voltage and pass through the holes 13a, 13b, etc. so as to stick to the substrate 4, thus forming the thin film. |
