| 摘要 |
PURPOSE:To enable the inspection of an object to be inspected efficiently at a high accuracy from the slant way without tilting it, by providing at least one inclined electron beam source on the object being inspected in addition to an electron beam source having a vertical axis with the axis thereof vertical to the object being inspected. CONSTITUTION:Secondary electron detectors R and L are provided above an X-Y table 1 slantly with respect to the table 1 and the amount of secondary electrons 9 generated from the surface of a wafer 2 by an electron beam 8 irradiated on the surface of the wafer 2 from an electron beam source A is converted into an electrical signal to be detected. Here, as there is a deviation caused in the spatial distribution of secondary electrons generated with the irradiation of the beam 2 at the corner of a pattern 21 formed on the surface of the wafer 2, causing a variation in the amount of electron beams 9 detected with the detectors R and L and the variation detection value is converted into image signal or the like, for instance, at a signal processing section 10 to be fed to a display section 11. Thus, a measuring person is enabled to recognize the dimensions or the like of the pattern 21. |
